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carbon tetrafluoride
———CAS: 75-73-0 fineness: >99.999%use：Plasma etching in the electronics industry, surface cleaning of electronic devices, decontamination of printed circuits, electrical insulati... -
Sulfur Hexafluoride
———CAS: 2551-62-4 fineness: >99.999%use：Insulation material for high-voltage switches, high-capacity transformers, high-voltage cables and gases. High-purity SF6 is also widely use... -
Hexafluoroethane
———CAS: 76-16-4 fineness: >99.999%use：Versatile etching technology commonly used in semiconductor production. It can be used for metal silicide and metal oxidation -
nitrous oxide
———CAS: 10024-97-2 fineness: >99.9995%use：Medical anesthetics, rocket propellants, racing accelerators, insecticides and sterilizers. In integrated circuit devices, IC cards, LEDs, m... -
Chlorine
———CAS: 7782-50-5 fineness: >99.999%use：For bleaching, making chlorine compounds, hydrochloric acid, polyvinyl chloride, can be used as a gas etchant in semiconductor production, e... -
trifluoromethane；Freon23
———CAS: 75-46-7 fineness: >99.999%use：Used as low temperature (-100℃) refrigerant, electronic industry plasma chemical etchant and raw material for fluorine compounds, refrigera... -
boron trichloride，Boron chloride
———CAS: 10294-34-5 fineness: >99.999%use：Preparation of high-purity boron and organic boron. Doping, Etching, Fabrication of Optical Fibers, Diffusion. -
Silane
———CAS: 7803-62-5 fineness: >99.9999%use：Silanes are widely used in the microelectronics, optoelectronics industries, manufacturing solar cells, flat panel displays, glass and steel...
