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  • carbon tetrafluoride

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    CAS: 75-73-0 fineness: >99.999%
    use:Plasma etching in the electronics industry, surface cleaning of electronic devices, decontamination of printed circuits, electrical insulati...
  • Sulfur Hexafluoride

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    CAS: 2551-62-4 fineness: >99.999%
    use:Insulation material for high-voltage switches, high-capacity transformers, high-voltage cables and gases. High-purity SF6 is also widely use...
  • Hexafluoroethane

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    CAS: 76-16-4 fineness: >99.999%
    use:Versatile etching technology commonly used in semiconductor production. It can be used for metal silicide and metal oxidation
  • nitrous oxide

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    CAS: 10024-97-2 fineness: >99.9995%
    use:Medical anesthetics, rocket propellants, racing accelerators, insecticides and sterilizers. In integrated circuit devices, IC cards, LEDs, m...
  • Chlorine

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    CAS: 7782-50-5 fineness: >99.999%
    use:For bleaching, making chlorine compounds, hydrochloric acid, polyvinyl chloride, can be used as a gas etchant in semiconductor production, e...
  • trifluoromethane;Freon23

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    CAS: 75-46-7 fineness: >99.999%
    use:Used as low temperature (-100℃) refrigerant, electronic industry plasma chemical etchant and raw material for fluorine compounds, refrigera...
  • boron trichloride,Boron chloride

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    CAS: 10294-34-5 fineness: >99.999%
    use:Preparation of high-purity boron and organic boron. Doping, Etching, Fabrication of Optical Fibers, Diffusion.
  • Silane

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    CAS: 7803-62-5 fineness: >99.9999%
    use:Silanes are widely used in the microelectronics, optoelectronics industries, manufacturing solar cells, flat panel displays, glass and steel...

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