-
SF4 (Sulfur tetrafluoride)
———CAS: 7783-60-0 fineness: 99%use:The most effective selective organic fluoride can selectively fluoride base and hydroxy groups (instead of oxygen containing base compounds)... -
DAST
———CAS: 38078-09-0 fineness: 95%use:Fluorinated reagents, fluorinated agents on anticancer drugs -
Fluorine nitrogen mixture(5%~30%)F2/N2
———CAS: 7782-41-4 fineness: Fluorine gas99%use:Widely used in the synthesis of pharmaceutical intermediates, the manufacture of chips in the electronic industry, the production of fluorin... -
carbon tetrafluoride
———CAS: 75-73-0 fineness: >99.999%use:Plasma etching in the electronics industry, surface cleaning of electronic devices, decontamination of printed circuits, electrical insulati... -
Sulfur Hexafluoride
———CAS: 2551-62-4 fineness: >99.999%use:Insulation material for high-voltage switches, high-capacity transformers, high-voltage cables and gases. High-purity SF6 is also widely use... -
Hexafluoroethane
———CAS: 76-16-4 fineness: >99.999%use:Versatile etching technology commonly used in semiconductor production. It can be used for metal silicide and metal oxidation -
nitrous oxide
———CAS: 10024-97-2 fineness: >99.9995%use:Medical anesthetics, rocket propellants, racing accelerators, insecticides and sterilizers. In integrated circuit devices, IC cards, LEDs, m... -
Chlorine
———CAS: 7782-50-5 fineness: >99.999%use:For bleaching, making chlorine compounds, hydrochloric acid, polyvinyl chloride, can be used as a gas etchant in semiconductor production, e... -
trifluoromethane;Freon23
———CAS: 75-46-7 fineness: >99.999%use:Used as low temperature (-100℃) refrigerant, electronic industry plasma chemical etchant and raw material for fluorine compounds, refrigera... -
Silane Argon Mixer(1-10%)
———fineness: SIH4: >99.9999%; AR: >99.9999%use:semiconductor industry