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SF4 (Sulfur tetrafluoride)
———CAS: 7783-60-0 fineness: 99%use：The most effective selective organic fluoride can selectively fluoride base and hydroxy groups (instead of oxygen containing base compounds)... -
DAST
———CAS: 38078-09-0 fineness: 95%use：Fluorinated reagents, fluorinated agents on anticancer drugs -
Fluorine nitrogen mixture（5%~30%）F2/N2
———CAS: 7782-41-4 fineness: Fluorine gas99%use：Widely used in the synthesis of pharmaceutical intermediates, the manufacture of chips in the electronic industry, the production of fluorin... -
carbon tetrafluoride
———CAS: 75-73-0 fineness: >99.999%use：Plasma etching in the electronics industry, surface cleaning of electronic devices, decontamination of printed circuits, electrical insulati... -
Sulfur Hexafluoride
———CAS: 2551-62-4 fineness: >99.999%use：Insulation material for high-voltage switches, high-capacity transformers, high-voltage cables and gases. High-purity SF6 is also widely use... -
Hexafluoroethane
———CAS: 76-16-4 fineness: >99.999%use：Versatile etching technology commonly used in semiconductor production. It can be used for metal silicide and metal oxidation -
nitrous oxide
———CAS: 10024-97-2 fineness: >99.9995%use：Medical anesthetics, rocket propellants, racing accelerators, insecticides and sterilizers. In integrated circuit devices, IC cards, LEDs, m... -
Chlorine
———CAS: 7782-50-5 fineness: >99.999%use：For bleaching, making chlorine compounds, hydrochloric acid, polyvinyl chloride, can be used as a gas etchant in semiconductor production, e... -
trifluoromethane；Freon23
———CAS: 75-46-7 fineness: >99.999%use：Used as low temperature (-100℃) refrigerant, electronic industry plasma chemical etchant and raw material for fluorine compounds, refrigera... -
Silane Argon Mixer（1-10%）
———fineness: SIH4: >99.9999%; AR: >99.9999%use：semiconductor industry
